Computer Simulation of Sputter-Deposition Processes
نویسندگان
چکیده
منابع مشابه
Sputter deposition processes
Sputter deposition is a widely used technique to deposit thin films on substrates. The technique is based upon ion bombardment of a source material, the target. Ion bombardment results in a vapor due to a purely physical process, i.e. the sputtering of the target material. Hence, this technique is part of the class of physical vapor deposition techniques, which includes, for example, thermal ev...
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Sputter deposition processes, especially for sputtering from metal targets, are well investigated. For practical reasons, i.e. for industrial processes, energetic considerations for sputter deposition are useful in order to optimize the sputtering process. In particular, for substrates at floating conditions it is required to obtain energetic conditions during film growth that enables sufficien...
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We have presented the kinetic study of the very initial growth stages of an ultra thin film (40Å-150Å) of Ag sputter-deposited on Si(001) substrate containing native oxide using grazing incidence x-ray reflectivity (GIXR) technique and Atomic Force Microscopy (AFM). We observe that the film consists of mounds with the presence of voids. The thickness 'd xray ' and the packing fraction 'η' of th...
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ژورنال
عنوان ژورنال: Journal of the Magnetics Society of Japan
سال: 1997
ISSN: 1880-4004,0285-0192
DOI: 10.3379/jmsjmag.21.s2_43